Redox characterization of semiconductors based on electrochemical measurements combined with UV-Vis diffuse reflectance spectroscopy
Abstract
Several techniques can be applied to characterize redox properties of wide bandgap semiconductors, however some of them are of limited use. In this paper we propose a new modification of the old spectroelectrochemical method developed two decades ago. A procedure based on measurements of the reflectance changes as a function of potential applied to the electrode coated with the studied material appears to be a very convenient tool for characterizing redox properties of semiconductors, forming either transparent or opaque films at a platinum electrode. A discussion on the measured redox parameters of semiconductor films concludes with a definition of a new term, the absorption onset potential of the material.