Design of patchy particles using ternary self-assembled monolayers
Abstract
Recent simulations have studied the formation of patterns in a binary mixture of immiscible
* Corresponding authors
a
Department of Chemical Engineering, University of Michigan, 3440 G.G.Brown Building, 2300 Hayward St., Ann Arbor, Michigan, US
E-mail:
inespons@umich.edu
Tel: +734 763 9895
b
Department of Materials Science and Engineering, University of Michigan, 3406 G.G.Brown Building, 2300 Hayward St., Ann Arbor, Michigan, US
E-mail:
sglotzer@umich.edu
Fax: +734 764 7453
Tel: +734 615 6296
Recent simulations have studied the formation of patterns in a binary mixture of immiscible
I. C. Pons-Siepermann and S. C. Glotzer, Soft Matter, 2012, 8, 6226 DOI: 10.1039/C2SM00014H
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