Jump to main content
Jump to site search

Issue 15, 2012
Previous Article Next Article

From soft to hard: the generation of functional and complex colloidal monolayers for nanolithography

Author affiliations

Abstract

Take polymer colloids—simple to make and ubiquitously available—let them self-assemble into a monolayer and you have, readily engineered, a sophisticated mask to create highly symmetric surface patterns with nanometre precision. Thirty years after its invention, this process, commonly referred to as colloidal lithography, is far from being old news and an ever-increasing range of scientists continues to use their creativity to come up with increasingly more complex surface patterns. As intriguing this technique is, the devil is in the details and it is far from trivial to achieve high order in a colloidal monolayer. This article reviews available crystallization techniques and discusses their scope and limitations in order to provide just the right method for your next experiment.

Graphical abstract: From soft to hard: the generation of functional and complex colloidal monolayers for nanolithography

Back to tab navigation

Article information


Submitted
30 Aug 2011
Accepted
25 Oct 2011
First published
18 Nov 2011

Soft Matter, 2012,8, 4044-4061
Article type
Review Article

From soft to hard: the generation of functional and complex colloidal monolayers for nanolithography

N. Vogel, C. K. Weiss and K. Landfester, Soft Matter, 2012, 8, 4044
DOI: 10.1039/C1SM06650A

Social activity

Search articles by author

Spotlight

Advertisements