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Issue 5, 2012
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Atomic layer deposition for nanofabrication and interface engineering

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Abstract

Atomic layer deposition (ALD) provides a tool for conformal coating on high aspect-ratio nanostructures with excellent uniformity. It has become a technique for both template-directed nanofabrications and engineering of surface properties. This Feature Article highlights the application of ALD in selected fields including photonics, SERS and energy materials. Specifically, the topics include fabrication of plasmonic nanostructures for the SERS applications, fabrication of 3-D nanoarchitectured photoanodes for solar energy conversions (dye-sensitized solar cells and photoelectrochemical cells), and coating of electrodes to enhance the cyclic stability and thus device life span of batteries. Dielectric coating for tailoring optical properties of semiconductor nanostructures is also discussed as exemplified by ZnO nanowires. Future direction of ALD in these applications is discussed at the end.

Graphical abstract: Atomic layer deposition for nanofabrication and interface engineering

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Article information


Submitted
29 Nov 2011
Accepted
22 Dec 2011
First published
04 Jan 2012

Nanoscale, 2012,4, 1522-1528
Article type
Feature Article

Atomic layer deposition for nanofabrication and interface engineering

M. Liu, X. Li, S. K. Karuturi, A. I. Y. Tok and H. J. Fan, Nanoscale, 2012, 4, 1522
DOI: 10.1039/C2NR11875K

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