Issue 5, 2012
From the journal:

Nanoscale

Nondestructive volumetric 3-D chemical mapping of nickel-sulfur compounds at the nanoscale

William M. Harris,a   George J. Nelson,a   Andrew M. Kiss,a   John R. Izzo, Jr.,a   Yong Liu,b   Meilin Liu,b   Steve Wang,c   Yong S. Chud  and  Wilson K. S. Chiu*a  

* Corresponding authors

a Department of Mechanical Engineering, University of Connecticut, 191 Auditorium Road, Unit 3139, Storrs, CT, USA
E-mail: wchiu@engr.uconn.edu
Tel: +860-486-3647

b Center for Innovative Fuel Cell and Battery Technologies, School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, Georgia, USA
E-mail: meilin.liu@mse.gatech.edu
Tel: +404-894-6114

c Advanced Photon Source, Argonne National Laboratory, Building 401, 9700 South Cass Avenue, Argonne, IL, USA
E-mail: yuwang@aps.anl.gov
Tel: +630-252-3789

d NSLS-II, Brookhaven National Laboratory, Upton, NY, USA
E-mail: ychu@bnl.gov
Tel: +631-344-5582

Abstract

Nano-structures of nickel (Ni) and nickel subsulfide (Ni3S2) materials were studied and mapped in 3D with high-resolution x-ray nanotomography combined with full field XANES spectroscopy. This method for characterizing these phases in complex microstructures is an important new analytical imaging technique, applicable to a wide range of nanoscale and mesoscale electrochemical systems.

Graphical abstract: Nondestructive volumetric 3-D chemical mapping of nickel-sulfur compounds at the nanoscale

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Article information

DOI
https://doi.org/10.1039/C2NR11690A
Article type
Communication
Submitted
09 Nov 2011
Accepted
06 Jan 2012
First published
10 Jan 2012

Nanoscale, 2012,4, 1557-1560

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Nondestructive volumetric 3-D chemical mapping of nickel-sulfur compounds at the nanoscale

W. M. Harris, G. J. Nelson, A. M. Kiss, J. R. Izzo, Y. Liu, M. Liu, S. Wang, Y. S. Chu and W. K. S. Chiu, Nanoscale, 2012, 4, 1557 DOI: 10.1039/C2NR11690A

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