Jump to main content
Jump to site search

Issue 2, 2012
Previous Article Next Article

Photolithographic surface micromachining of polydimethylsiloxane (PDMS)

Author affiliations


A major technical hurdle in microfluidics is the difficulty in achieving high fidelity lithographic patterning on polydimethylsiloxane (PDMS). Here, we report a simple yet highly precise and repeatable PDMS surface micromachining method using direct photolithography followed by reactive ion etching (RIE). Our method to achieve surface patterning of PDMS applied an O2 plasma treatment to PDMS to activate its surface to overcome the challenge of poor photoresist adhesion on PDMS for photolithography. Our photolithographic PDMS surface micromachining technique is compatible with conventional soft lithography techniques and other silicon-based surface and bulk micromachining methods. To illustrate the general application of our method, we demonstrated fabrication of large microfiltration membranes and free-standing beam structures in PDMS.

Graphical abstract: Photolithographic surface micromachining of polydimethylsiloxane (PDMS)

Back to tab navigation

Supplementary files

Article information

04 Aug 2011
04 Nov 2011
First published
17 Nov 2011

Lab Chip, 2012,12, 391-395
Article type
Technical Note

Photolithographic surface micromachining of polydimethylsiloxane (PDMS)

W. Chen, R. H. W. Lam and J. Fu, Lab Chip, 2012, 12, 391
DOI: 10.1039/C1LC20721K

Social activity

Search articles by author