Large-area, highly oriented lamellar block copolymer nanopatterning directed by graphoepitaxially assembled cylinder nanopatterns†
Abstract
We present a large-area, highly aligned lamellar
* Corresponding authors
a
Department of Materials Science and Engineering, KAIST, Daejeon, Republic of Korea
E-mail:
sangouk.kim@kaist.ac.kr
Fax: +82 42 350 3310
Tel: +82 42 350 3339
b LCD R&D Center, Samsung Electronics, 446-920 446-711 95 Samsung2-Ro, Kihung-Gu, Yong-In City, Kyungki-Do, Korea
We present a large-area, highly aligned lamellar
H. Moon, D. O. Shin, B. H. Kim, H. M. Jin, S. Lee, M. G. Lee and S. O. Kim, J. Mater. Chem., 2012, 22, 6307 DOI: 10.1039/C2JM15842F
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