Tailoring the charge carrier dynamics in ZnO nanowires: the role of surface hole/electron traps†
Abstract
Post-fabrication thermal-annealed ZnO
* Corresponding authors
a
Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, 21 Nanyang Link, Singapore 637371, Singapore
E-mail:
tzechien@ntu.edu.sg
b
Institute of Materials Research and Engineering, 3 Research Link, Singapore 117602, Singapore
E-mail:
xh-zhang@imre.a-star.edu.sg
Post-fabrication thermal-annealed ZnO
M. Li, G. Xing, L. F. N. Ah Qune, G. Xing, T. Wu, C. H. A. Huan, X. Zhang and T. C. Sum, Phys. Chem. Chem. Phys., 2012, 14, 3075 DOI: 10.1039/C2CP23425D
To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.
If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.
If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.
Read more about how to correctly acknowledge RSC content.
Fetching data from CrossRef.
This may take some time to load.
Loading related content