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Issue 5, 2012
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Thermal behavior of MOCVD-grown Cu-clusters on ZnO(10[1 with combining macron]0)

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Abstract

Scanning tunnelling microscopy (STM) and X-ray photoelectron spectroscopy (XPS, AES) were used to study MOCVD of Cu-clusters on the mixed terminated ZnO(10[1 with combining macron]0) surface in comparison to MBE Cu-deposition. Both deposition methods result in the same Cu cluster morphology. After annealing to 670 K the amount of Cu visible above the oxide surface is found to decrease substantially, indicating a substantial diffusion of Cu atoms inside the ZnO-bulk. The spectroscopic data do not show any evidence for changes in the Cu oxidation state during thermal treatment up to 770 K.

Graphical abstract: Thermal behavior of MOCVD-grown Cu-clusters on ZnO(10 [[1 with combining macron]] 0)

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Publication details

The article was received on 12 Sep 2011, accepted on 30 Nov 2011 and first published on 21 Dec 2011


Article type: Paper
DOI: 10.1039/C2CP22901C
Phys. Chem. Chem. Phys., 2012,14, 1654-1659

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    Thermal behavior of MOCVD-grown Cu-clusters on ZnO(10[1 with combining macron]0)

    M. Kroll, T. Löber, V. Schott, C. Wöll and U. Köhler, Phys. Chem. Chem. Phys., 2012, 14, 1654
    DOI: 10.1039/C2CP22901C

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