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Issue 66, 2012
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Photoelectrochemical performance enhanced by a nickel oxide–hematite p–n junction photoanode†

Jiangtian Li,a   Fanke Meng,a   Savan Suri,a   Weiqiang Ding,a   Fuqiang Huangb  and  Nianqiang Wu*a  
Author affiliations

* Corresponding authors

a Department of Mechanical and Aerospace Engineering, West Virginia University, Morgantown, USA
E-mail: nick.wu@mail.wvu.edu
Fax: +1 304 293 6689
Tel: +1 304 293 3326

b Shanghai Institute of Ceramics, Chinese Academy of Science, Shanghai 200050, China

Abstract

A p–n junction photoanode has been fabricated by depositing p-type NiO nanoparticles on the n-type hematite thin film. Such a photoanode is employed for a photoelectrochemical cell. NiO not only facilitates the extraction of accumulated holes from hematite via the p–n junction, but also lowers the barrier for oxygen evolution reaction.

Graphical abstract: Photoelectrochemical performance enhanced by a nickel oxide–hematite p–n junction photoanode

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Article information

https://doi.org/10.1039/C2CC30376K
Submitted
16 Jan 2012
Accepted
26 Jun 2012
First published
27 Jun 2012
Chem. Commun., 2012,48, 8213-8215
Article type
Communication
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Photoelectrochemical performance enhanced by a nickel oxide–hematite p–n junction photoanode

J. Li, F. Meng, S. Suri, W. Ding, F. Huang and N. Wu, Chem. Commun., 2012, 48, 8213
DOI: 10.1039/C2CC30376K

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