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Issue 4, 2012
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High-throughput preparation of complex multi-scale patterns from block copolymer/homopolymer blend films

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Abstract

A simple, straightforward process for fabricating multi-scale micro- and nanostructured patterns from polystyrene-block-poly(2-vinylpyridine) (PS-b-P2VP)/poly(methyl methacrylate) (PMMA) homopolymer in a preferential solvent for PS and PMMA is demonstrated. When the PS-b-P2VP/PMMA blend films were spin-coated onto a silicon wafer, PS-b-P2VP micellar arrays consisting of a PS corona and a P2VP core were formed, while the PMMA macrodomains were isolated, due to the macrophase separation caused by the incompatibility between block copolymer micelles and PMMA homopolymer during the spin-coating process. With an increase of PMMA composition, the size of PMMA macrodomains increased. Moreover, the P2VP blocks have a strong interaction with a native oxide of the surface of the silicon wafer, so that the P2VP wetting layer was first formed during spin-coating, and PS nanoclusters were observed on the PMMA macrodomains beneath. Whereas when a silicon surface was modified with a PS brush layer, the PS nanoclusters underlying PMMA domains were not formed. The multi-scale patterns prepared from copolymer micelle/homopolymer blend films are used as templates for the fabrication of gold nanoparticle arrays by incorporating the gold precursor into the P2VP chains. The combination of nanostructures prepared from block copolymer micellar arrays and macrostructures induced by incompatibility between the copolymer and the homopolymer leads to the formation of complex, multi-scale surface patterns by a simple casting process.

Graphical abstract: High-throughput preparation of complex multi-scale patterns from block copolymer/homopolymer blend films

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Publication details

The article was received on 19 Nov 2011, accepted on 08 Dec 2011 and first published on 12 Dec 2011


Article type: Paper
DOI: 10.1039/C2NR11792D
Nanoscale, 2012,4, 1362-1367

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    High-throughput preparation of complex multi-scale patterns from block copolymer/homopolymer blend films

    H. Park, J. Kim and S. Park, Nanoscale, 2012, 4, 1362
    DOI: 10.1039/C2NR11792D

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