Jump to main content
Jump to site search

Issue 5, 2012
Previous Article Next Article

Atomic layer deposition for nanofabrication and interface engineering

Author affiliations

Abstract

Atomic layer deposition (ALD) provides a tool for conformal coating on high aspect-ratio nanostructures with excellent uniformity. It has become a technique for both template-directed nanofabrications and engineering of surface properties. This Feature Article highlights the application of ALD in selected fields including photonics, SERS and energy materials. Specifically, the topics include fabrication of plasmonic nanostructures for the SERS applications, fabrication of 3-D nanoarchitectured photoanodes for solar energy conversions (dye-sensitized solar cells and photoelectrochemical cells), and coating of electrodes to enhance the cyclic stability and thus device life span of batteries. Dielectric coating for tailoring optical properties of semiconductor nanostructures is also discussed as exemplified by ZnO nanowires. Future direction of ALD in these applications is discussed at the end.

Graphical abstract: Atomic layer deposition for nanofabrication and interface engineering

Back to tab navigation

Publication details

The article was received on 29 Nov 2011, accepted on 22 Dec 2011 and first published on 04 Jan 2012


Article type: Feature Article
DOI: 10.1039/C2NR11875K
Nanoscale, 2012,4, 1522-1528

  •   Request permissions

    Atomic layer deposition for nanofabrication and interface engineering

    M. Liu, X. Li, S. K. Karuturi, A. I. Y. Tok and H. J. Fan, Nanoscale, 2012, 4, 1522
    DOI: 10.1039/C2NR11875K

Search articles by author

Spotlight

Advertisements