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Issue 60, 2012
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Top-down patterning of Zeolitic Imidazolate Framework composite thin films by deep X-ray lithography

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Abstract

For the first time a top-down process was used to control the spatial location of Metal–Organic Frameworks on a surface. Deep X-ray lithography was utilised to micropattern a Zeolitic Imidazolate Framework layer on a sol–gel surface, with exposure hardening the sol–gel by inducing crosslinking while leaving the frameworks intact.

Graphical abstract: Top-down patterning of Zeolitic Imidazolate Framework composite thin films by deep X-ray lithography

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Article information


Submitted
08 May 2012
Accepted
31 May 2012
First published
08 Jun 2012

Chem. Commun., 2012,48, 7483-7485
Article type
Communication

Top-down patterning of Zeolitic Imidazolate Framework composite thin films by deep X-ray lithography

C. Dimitrakakis, B. Marmiroli, H. Amenitsch, L. Malfatti, P. Innocenzi, G. Grenci, L. Vaccari, A. J. Hill, B. P. Ladewig, M. R. Hill and P. Falcaro, Chem. Commun., 2012, 48, 7483
DOI: 10.1039/C2CC33292B

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