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Issue 9, 2011
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Reversible structuring of photosensitive polymer films by surface plasmon near field radiation

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Abstract

We report on the fabrication and characterisation of a novel type of hybrid azo-modified photosensitive polymer film with a nanoscale metallic structuring integrated into the substrate. The metal structures permit to generate surface plasmon near fields when irradiated by UV-light from the rear without directly illuminating the polymer. This allows establishment of a localized, complex-shape intensity distribution at sub-wavelength resolution with a corresponding impact on the photosensitive polymer. The possibilities of exploiting this setup are manifold. We find that just by using the change of polarization of the incident light as means of control, the topography can be driven to change between various patterns reversibly. These results are confirmed by numerical simulations and compared with in situ recorded topography changes.

Graphical abstract: Reversible structuring of photosensitive polymer films by surface plasmon near field radiation

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Supplementary files

Article information


Submitted
15 Oct 2010
Accepted
10 Dec 2010
First published
24 Jan 2011

Soft Matter, 2011,7, 4174-4178
Article type
Paper

Reversible structuring of photosensitive polymer films by surface plasmon near field radiation

T. König, L. M. Goldenberg, O. Kulikovska, L. Kulikovsky, J. Stumpe and S. Santer, Soft Matter, 2011, 7, 4174
DOI: 10.1039/C0SM01164A

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