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Issue 10, 2011
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Poly(N-protected ethylene imine-alt-ethylene sulfide) block to functionalize polymeric materials†

Yoichi Hori,a   Na Pei,a   Ryota Kumagaia  and  Yuji Sasanuma*a  
Author affiliations

* Corresponding authors

a Department of Applied Chemistry and Biotechnology, Faculty of Engineering, Chiba University, 1-33 Yayoi-cho, Inage-ku, Chiba, Japan
E-mail: sasanuma@faculty.chiba-u.jp
Fax: +81-43-290-3394
Tel: +81-43-290-3394

Abstract

Poly(N-tosyl-ethylene imine-alt-ethylene sulfide) has been synthesized by thiol-ene photopolymerization between N,N-bis(2-mercaptoethyl)-4-methylbenzenesulfonamide and 4-methyl-N,N-divinylbenzenesulfonamide. Its weight-average molecular weight was determined by static light scattering to be 2.8 × 104. The alternating copolymer has –SH and –CH=CH2 end groups and exhibits high solubility in common organic solvents such as chloroform, tetrahydrofuran, acetone, and dimethyl sulfoxide. The N-tosylated copolymer was deprotected to yield poly(ethylene imine-alt-ethylene sulfide), which is fully soluble in dimethyl sulfoxide, acetic acid, and ethanol. Both N-tosylated and deprotected polymers are hydrophobic, and the former and latter polymers are thermally decomposed at 272 and 244 °C, respectively.

Graphical abstract: Poly(N-protected ethylene imine-alt-ethylene sulfide) block to functionalize polymeric materials

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Article information

https://doi.org/10.1039/C1PY00264C
Submitted
10 Jun 2011
Accepted
13 Jul 2011
First published
11 Aug 2011
Polym. Chem., 2011,2, 2183-2185
Article type
Communication
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Poly(N-protected ethylene imine-alt-ethylene sulfide) block to functionalize polymeric materials

Y. Hori, N. Pei, R. Kumagai and Y. Sasanuma, Polym. Chem., 2011, 2, 2183
DOI: 10.1039/C1PY00264C

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