A protected annealing strategy to enhanced light emission and photostability of YAG:Ce nanoparticle-based films†
Abstract
A significant obstacle in the development of YAG:Ce
- This article is part of the themed collection: Optical Materials
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* Corresponding authors
a
Physique de la Matière Condensée, CNRS, Ecole Polytechnique, Palaiseau, France
E-mail:
amelie.revaux@polytechnique.edu
Fax: +33(1) 69 33 47 99
Tel: +33(1) 69 33 47 16
b
Department of Chemical Engineering, University of California, Santa Barbara, CA, USA
E-mail:
nathan_george@umail.ucsb.edu
Fax: +1 805 893 8797
Tel: +1 402 740 4858
c
Materials Department and Materials Research Laboratory, University of California, Santa Barbara, USA
E-mail:
seshadri@mrl.ucsb.edu
Fax: +1 805 893 6129
Tel: +1 805 893 8797
A significant obstacle in the development of YAG:Ce
A. Revaux, G. Dantelle, N. George, R. Seshadri, T. Gacoin and J. Boilot, Nanoscale, 2011, 3, 2015 DOI: 10.1039/C0NR01000F
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