Beyond PDMS: off-stoichiometry thiol–ene (OSTE) based soft lithography for rapid prototyping of microfluidic devices†
Abstract
In this article we introduce a novel
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* Corresponding authors
a
Microsystem Technology, KTH Royal Institute of Technology, Osquldasväg 10, Stockholm, Sweden
E-mail:
fredrik.carlborg@ee.kth.se
Tel: +46 87907794
b Division of Coating Technology, Fibre and Polymer Technology, KTH Royal Institute of Technology, Teknikringen 56-58, Stockholm, Sweden
In this article we introduce a novel
C. F. Carlborg, T. Haraldsson, K. Öberg, M. Malkoch and W. van der Wijngaart, Lab Chip, 2011, 11, 3136 DOI: 10.1039/C1LC20388F
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