Novel photoinitiator with a radical quenching moiety for confining radical diffusion in two-photon induced photopolymerization
Abstract
We designed and synthesized a novel two-
* Corresponding authors
a
Laboratory of Organic NanoPhotonics and Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, No.2, Beiyitiao, Zhongguancun, Haidian District, Beijing, China
E-mail:
chenwq7315@mail.ipc.ac.cn, xmduan@mail.ipc.ac.cn
Fax: +86-10-82543597
Tel: +86-10-82543596
b Graduate School of Chinese Academy of Sciences, No.2, Beiyitiao, Zhongguancun Road, Haidian District, Beijing, China
We designed and synthesized a novel two-
W. Lu, X. Dong, W. Chen, Z. Zhao and X. Duan, J. Mater. Chem., 2011, 21, 5650 DOI: 10.1039/C0JM04025H
To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.
If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.
If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.
Read more about how to correctly acknowledge RSC content.
Fetching data from CrossRef.
This may take some time to load.
Loading related content