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Issue 11, 2011
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Solvent response of polymers for micromachine manipulation

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Abstract

A novel solvent responsive polymer micromachine has been successfully fabricated by two-photon photopolymerization (TPP) of methacrylate-based photoresists. The moving part of the micromachine could be easily driven by interfacial solvent polarity induced swelling and shrinking of the photopolymer networks. Furthermore, the driving performance of the micromachine could be precisely modulated by varying the laser scanning step length during fabrication.

Graphical abstract: Solvent response of polymers for micromachine manipulation

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Article information


Submitted
02 Oct 2010
Accepted
18 Jan 2011
First published
11 Feb 2011

Phys. Chem. Chem. Phys., 2011,13, 4835-4838
Article type
Communication

Solvent response of polymers for micromachine manipulation

Y. Tian, Y. Zhang, H. Xia, L. Guo, J. Ku, Y. He, R. Zhang, B. Xu, Q. Chen and H. Sun, Phys. Chem. Chem. Phys., 2011, 13, 4835
DOI: 10.1039/C0CP02006K

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