Post-deposition annealing control of phase and texture for the sputtered MoO3 films
Abstract
Thin films were sputtered on Si substrates from a metallic Mo target at room temperature and then annealed in air at the temperatures between 200–550 °C to form MoO3 of various phases and textures. The films annealed at 450 °C for 1 h showed a pure α phase and their texture was dependent on the ambient pressure during the initial sputtering deposition. The films sputtered under 3 mTorr were b-axis oriented with a broad in-plane alignment after