Morphology of magneto-electrodeposited Cu2O microcrystals
Abstract
Morphological development during electrocrystallization of cuprous
* Corresponding authors
a
LACMDTI, LRC CEA, Université de Reims Champagne Ardenne, B.P. 1039, Reims Cedex 2, France
E-mail:
al.daltin@univ-reims.fr
Fax: +33 326918915
Tel: +33 326918449
b Unité Matériaux et Transformations, CNRS UMR 8207—Université Lille 1, Bât. C6, Villeneuve d'Ascq, France
Morphological development during electrocrystallization of cuprous
A. Daltin, A. Addad, P. Baudart and J. Chopart, CrystEngComm, 2011, 13, 3373 DOI: 10.1039/C0CE00691B
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