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Issue 21, 2011

Superhydrophobic nanostructured silicon surfaces with controllable broadband reflectance

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Abstract

Nanostructured superhydrophobic silicon surfaces with tunable reflectance are fabricated via a simple maskless deep reactive-ion etching process. By controlling the scale of the high-aspect-ratio nanostructures on a wafer-scale surface, surface reflectance is maximized or minimized over the UV–vis–IR range while maintaining superhydrophobic properties.

Graphical abstract: Superhydrophobic nanostructured silicon surfaces with controllable broadband reflectance

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Article information


Submitted
21 Mar 2011
Accepted
08 Apr 2011
First published
26 Apr 2011

Chem. Commun., 2011,47, 6108-6110
Article type
Communication

Superhydrophobic nanostructured silicon surfaces with controllable broadband reflectance

S. J. Cho, T. An, J. Y. Kim, J. Sung and G. Lim, Chem. Commun., 2011, 47, 6108 DOI: 10.1039/C1CC11615K

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