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Issue 36, 2011
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Low loss photopatternable matrix materials for LWIR-metamaterial applications

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Abstract

Transparent matrix materials with low-loss and low-permittivity are an important component of integrated optical devices including filters, lenses, and novel metamaterials. Many of the structural matrix materials that are currently utilized at visible and near-infrared wavelengths, such as solution deposited, high-k dielectrics and commercial photoresists, exhibit vibrational absorption bands in the 8–12 μm spectral range which represents a significant challenge to developing transmissive, three-dimensional (3D) metamaterials operating in the long wavelength infrared (LWIR) spectral region. In this paper, we present new, low loss photopatternable polymer dielectrics as well-suited matrix materials for fabricating LWIR-metamaterials. These materials are synthesized by partially hydrogenating polynorbornene to varying degrees followed by a thiol-ene coupling reaction to cross-link the remaining olefin groups. After cross-linking, the olefin LWIR-absorption band is minimized and the glass transition temperature (Tg) of the material increases. Thick layers of the polymer (>3 μm), which acts as a negative photoresist, can be deposited easily using a spin coating technique to develop planarizing layers with photopatternable vias. A demonstration on the low loss nature of the polymer dielectrics was carried out by incorporating the polymer into an all-dielectric, infrared metamaterial. Thus, the material is ideal for both lithography and fabrication of 3D metamaterial structures operating in the LWIR spectral region.

Graphical abstract: Low loss photopatternable matrix materials for LWIR-metamaterial applications

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Publication details

The article was received on 15 Jun 2011, accepted on 25 Jul 2011 and first published on 09 Aug 2011


Article type: Paper
DOI: 10.1039/C1JM12761F
J. Mater. Chem., 2011,21, 13902-13908

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    Low loss photopatternable matrix materials for LWIR-metamaterial applications

    R. D. Rasberry, Y. Lee, J. C. Ginn, P. F. Hines, C. L. Arrington, A. E. Sanchez, M. T. Brumbach, P. G. Clem, D. W. Peters, M. B. Sinclair and S. M. Dirk, J. Mater. Chem., 2011, 21, 13902
    DOI: 10.1039/C1JM12761F

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