Issue 22, 2010

Novel thin film composite membrane containing ionizable hydrophobes: pH-dependent reverse osmosis behavior and improved chlorine resistance

Abstract

New polyamide thin film composite membranes were prepared by interfacial polymerization of hexafluoroalcohol (HFA)-containing aromatic diamine and trimesoyl chloride (TMC) on a porous polysulfone support. The surface properties of the resulting membranes were characterized by water contact angle, XPS, and SEM. Additionally, the desalination separation performance was evaluated by the cross-flow filtration of 2000 ppm NaCl solution. Water contact angle and XPS analyses indicated that the HFA-containing polyamide membrane is relatively hydrophobic at neutral conditions but becomes hydrophilic at basic conditions due to ionization of the HFA groups, so we refer to this group as an “ionizable hydrophobe” or “i-phobe”. The membrane showed strongly pH-dependent reverse osmosis behavior with enhanced performance (high water flux and high salt rejection) at high pH (ca. 10). Both the electron withdrawing nature and the steric bulkiness of the HFA functionality are also advantageous in protecting the polyamide membrane from chlorine attack. Based upon NMR studies of model polymers (linear polyamides with and without the HFA functionality) and the membrane performance measured before and after chlorine exposure, the HFA-containing polyamide has improved chlorine stability compared to the reference polyamide made from m-phenylenediamine and TMC.

Graphical abstract: Novel thin film composite membrane containing ionizable hydrophobes: pH-dependent reverse osmosis behavior and improved chlorine resistance

Article information

Article type
Paper
Submitted
02 Dec 2009
Accepted
23 Jan 2010
First published
23 Feb 2010

J. Mater. Chem., 2010,20, 4615-4620

Novel thin film composite membrane containing ionizable hydrophobes: pH-dependent reverse osmosis behavior and improved chlorine resistance

Y. La, R. Sooriyakumaran, D. C. Miller, M. Fujiwara, Y. Terui, K. Yamanaka, B. D. McCloskey, B. D. Freeman and R. D. Allen, J. Mater. Chem., 2010, 20, 4615 DOI: 10.1039/B925270C

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Spotlight

Advertisements