Photo-induced hybrid nanopatterning of titanium dioxidevia direct imprint lithography†
Abstract
A novel ultraviolet (UV)-assisted imprinting procedure that employs photosensitive
* Corresponding authors
a
Nanomechanical System Research Center, Korea Institute of Machinery and Materials, Daejeon, Korea
E-mail:
jhjeong@kimm.re.kr
Fax: +82 42 868 7123
Tel: +82 42 868 7604
b Department of Materials Science and Engineering, Yonsei University, Seoul, Korea
c 4D Labs and Department of Chemistry, Simon Fraser University, Burnaby, BC, Canada
A novel ultraviolet (UV)-assisted imprinting procedure that employs photosensitive
H. Park, D. Choi, X. Zhang, S. Jeon, S. Park, S. Lee, S. Kim, K. Kim, J. Choi, J. Lee, D. K. Yun, K. J. Lee, H. Park, R. H. Hill and J. Jeong, J. Mater. Chem., 2010, 20, 1921 DOI: 10.1039/B921343K
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