Photo-assisted preparation and patterning of large-area reduced graphene oxide–TiO2 conductive thin film†
Abstract
A mild photo-assisted
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* Corresponding authors
a
Center for Advanced Optoelectronic Functional Materials Research, and Key Laboratory for UV-Emitting Materials and Technology of Ministry of Education, Northeast Normal University, 5268 Renmin Street, Changchun 130024, People's Republic of China
E-mail:
xtzhang@nenu.edu.cn
Fax: +81 431 85099772
Tel: +81 431 85099772
b
State Key Laboratory of Superhard Materials, Jilin University, Changchun 130012, People's Republic of China
E-mail:
wtzheng@jlu.edu.cn
Tel: +81 431 85168246
c
Department of Materials Science, Jilin University, Changchun 130012, People's Republic of China
E-mail:
wtzheng@jlu.edu.cn
Tel: +81 431 85168246
d
Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, People's Republic of China
E-mail:
lxl@ciac.jl.cn
Tel: +81 431 85262213
A mild photo-assisted
B. Li, X. Zhang, X. Li, L. Wang, R. Han, B. Liu, W. Zheng, X. Li and Y. Liu, Chem. Commun., 2010, 46, 3499 DOI: 10.1039/C002200D
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