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Issue 14, 2010
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Patterning microfluidic device wettability using flow confinement

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Abstract

We present a simple method to spatially pattern the surface properties of microfluidic devices using flow confinement. Our technique allows surface patterning with micron-scale resolution. To demonstrate its effectiveness, we use it to pattern wettability to form W/O/W and O/W/O double emulsions.

Graphical abstract: Patterning microfluidic device wettability using flow confinement

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Publication details

The article was received on 10 Mar 2010, accepted on 05 May 2010 and first published on 21 May 2010


Article type: Communication
DOI: 10.1039/C004124F
Lab Chip, 2010,10, 1774-1776

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    Patterning microfluidic device wettability using flow confinement

    A. R. Abate, J. Thiele, M. Weinhart and D. A. Weitz, Lab Chip, 2010, 10, 1774
    DOI: 10.1039/C004124F

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