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Issue 9, 2010
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Measurement of element mass distributions in particle ensembles applying ICP-OES

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Abstract

End-on inductively coupled plasma optical emission spectrometry (ICP-OES) of the relative mass distributions in ensembles of spherical SiO2 particles with small and large size variations is presented. The particles are introduced into the ICP by injection of monodisperse microdroplets generated from diluted particle suspensions. The spectroscopic signals, taking into account the peak or the integrated intensities of the Si 288.16 nm line, are compared with mass distribution measurements of corresponding SiO2 particle ensembles performed by Scanning Electron Microscopy (SEM). It is found that the relative mass distributions measured by ICP-OES are in good agreement with SEM measurements if the spectroscopic signal to noise ratio is sufficiently large indicating that intensity variations due to different particle trajectories in the ICP are less important than expected.

Graphical abstract: Measurement of element mass distributions in particle ensembles applying ICP-OES

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Publication details

The article was received on 07 Apr 2010, accepted on 25 May 2010 and first published on 18 Jun 2010


Article type: Paper
DOI: 10.1039/C004946H
J. Anal. At. Spectrom., 2010,25, 1395-1401

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    Measurement of element mass distributions in particle ensembles applying ICP-OES

    A. Murtazin, S. Groh and K. Niemax, J. Anal. At. Spectrom., 2010, 25, 1395
    DOI: 10.1039/C004946H

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