Atomic layer deposition of lithium containing thin films
Abstract
Five different lithium containing compounds, all representing different chemical systems, were studied in order to deposit lithium containing films by
Maintenance work is planned from 21:00 BST on Tuesday 20th August 2024 to 21:00 BST on Wednesday 21st August 2024, and on Thursday 29th August 2024 from 11:00 to 12:00 BST.
During this time the performance of our website may be affected - searches may run slowly, some pages may be temporarily unavailable, and you may be unable to log in or to access content. If this happens, please try refreshing your web browser or try waiting two to three minutes before trying again.
We apologise for any inconvenience this might cause and thank you for your patience.
* Corresponding authors
a Beneq Oy, P.O. Box 262, Vantaa, Finland
b Laboratory of Inorganic Chemistry, Department of Chemistry, Helsinki University of Technology, P.O. Box 6100, Finland
c
Centre for Materials Science and Nanotechnology, Department of Chemistry, University of Oslo, P.O. Box 1033, Blindern, N-0315 Oslo, Norway
E-mail:
titta.aaltonen@smn.uio.no
Fax: +47 2285 5565
Tel: +47 2285 8639
d Department of Physics, University of Jyväskylä, P.O. Box 35, Jyväskylä, Finland
Five different lithium containing compounds, all representing different chemical systems, were studied in order to deposit lithium containing films by
M. Putkonen, T. Aaltonen, M. Alnes, T. Sajavaara, O. Nilsen and H. Fjellvåg, J. Mater. Chem., 2009, 19, 8767 DOI: 10.1039/B913466B
To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.
If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.
If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.
Read more about how to correctly acknowledge RSC content.
Fetching data from CrossRef.
This may take some time to load.
Loading related content