Issue 30, 2009
From the journal:

Journal of Materials Chemistry

High voltage polymer solar cell patterned with photolithography†

Yee-Fun Lim,a   Jin-Kyun Lee,a   Alexander A. Zakhidov,a   John A. DeFranco,a   Hon Hang Fong,a   Priscilla G. Taylor,a   Christopher K. Obera  and  George G. Malliaras*a  

* Corresponding authors

a Department of Materials Science and Engineering, Cornell University, Ithaca, NY, USA
E-mail: ggm1@cornell.edu
Fax: +1 607 255 2365
Tel: +1 607 255 1956

Abstract

An acid-sensitive semiperfluoroalkyl resorcinarene has recently been demonstrated as an effective photoresist for the photolithographic patterning of organic semiconductor materials. In this work, we show that it can be used to pattern polymer solar cells fabricated from a blend of poly(3-hexylthiophene) (P3HT) and [6,6]-phenyl-C61 butyric acid methyl ester (PCBM), so as to obtain high open circuit voltages (Voc). An array of 300 solar cells in series, with a period of 50 µm, achieved a Voc of 90 V and a power conversion efficiency (PCE) of 0.3%.

Graphical abstract: High voltage polymer solar cell patterned with photolithography

  • This article is part of the themed collection: Solar cells
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Article information

DOI
https://doi.org/10.1039/B822949J
Article type
Paper
Submitted
19 Dec 2008
Accepted
27 Mar 2009
First published
05 May 2009

J. Mater. Chem., 2009,19, 5394-5397

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High voltage polymer solar cell patterned with photolithography

Y. Lim, J. Lee, A. A. Zakhidov, J. A. DeFranco, H. H. Fong, P. G. Taylor, C. K. Ober and G. G. Malliaras, J. Mater. Chem., 2009, 19, 5394 DOI: 10.1039/B822949J

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