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Issue 4, 2009
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Epitaxially grown GaN nanowire networks

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Abstract

GaN nanowires grown by means of the chemical vapor deposition (CVD) method on a catalyst-deposited substrate are typically known to exhibit a vertical growth pattern and crystallize in the hexagonal wurtzite structure. Here, we demonstrate CVD grown GaN nanowires on Ni-catalyst deposited sapphire substrates where the nanowires exhibit a horizontally aligned, epitaxial growth pattern. The nanowires are in the form of organized networks with hexagonal symmetry which coincides with the surface structure of the sapphire substrate. This growth pattern is achieved through the use of a controlled catalyst deposition method which produces Ni catalyst nanoparticles with small diameter, less than 50nm. Photoluminescence measurements indicate a possible cubic zinc blende type crystal structure. Transport measurements indicate excellent current-carrying capacity for such epitaxial GaN nanowires with potential applications in advanced nanoelectronic devices as demonstrated here by a top-gate nanowire FET. The large area scalability of the network growth pattern and easy compatibility with device-fabrication processes make such epitaxial GaN nanowire networks potentially significant for advanced nanoscale devices.

Graphical abstract: Epitaxially grown GaN nanowire networks

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Publication details

The article was received on 15 Sep 2008, accepted on 17 Oct 2008 and first published on 27 Oct 2008


Article type: Communication
DOI: 10.1039/B816064C
J. Mater. Chem., 2009,19, 463-467

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    Epitaxially grown GaN nanowire networks

    Z. Wu, M. G. Hahm, Y. J. Jung and L. Menon, J. Mater. Chem., 2009, 19, 463
    DOI: 10.1039/B816064C

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