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Issue 31, 2009
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Solvent properties of hydrazine in the preparation of metal chalcogenide bulk materials and films

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Abstract

A combination of unique solvent properties of hydrazine enables the direct dissolution of a range of metal chalcogenides at ambient temperature, rendering this an extraordinarily simple and soft synthetic approach to prepare new metal chalcogenide-based materials. The extended metal chalcogenide parent framework is broken up during this process, and the resulting metal chalcogenide building units are re-organized into network structures (from 0D to 3D) based upon their interactions with the hydrazine/hydrazinium moieties. This Perspective will review recent crystal and materials chemistry developments within this family of compounds and will briefly discuss the utility of this approach in metal chalcogenide thin-film deposition.

Graphical abstract: Solvent properties of hydrazine in the preparation of metal chalcogenide bulk materials and films

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Publication details

The article was received on 12 Jan 2009, accepted on 18 Mar 2009 and first published on 20 Apr 2009


Article type: Perspective
DOI: 10.1039/B900617F
Dalton Trans., 2009, 6078-6088

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    Solvent properties of hydrazine in the preparation of metal chalcogenide bulk materials and films

    M. Yuan and D. B. Mitzi, Dalton Trans., 2009, 6078
    DOI: 10.1039/B900617F

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