Electronic structure of Lewis acid sites on high surface area aluminium fluorides: a combined XPS and ab initio investigation
Abstract
High surface area (HS) AlF3 samples have been examined by
* Corresponding authors
a
Molecular Materials Centre, The University of Manchester, Sackville Street, PO Box 88, Manchester, UK
E-mail:
s.schroeder@manchester.ac.uk
b School of Chemical Engineering and Analytical Science, The University of Manchester, Sackville Street, PO Box 88, Manchester, UK
c STFC Daresbury Laboratory, Daresbury, Warrington, Cheshire, UK
d Institute of Chemistry, Humboldt University of Berlin, Brook Taylor Straße 2, 12489 Berlin, Germany
e School of Chemistry, The University of Manchester, Brunswick Street, Manchester, UK
f Department of Chemistry, Imperial College London, London, UK
High surface area (HS) AlF3 samples have been examined by
A. Makarowicz, C. L. Bailey, N. Weiher, E. Kemnitz, S. L. M. Schroeder, S. Mukhopadhyay, A. Wander, B. G. Searle and N. M. Harrison, Phys. Chem. Chem. Phys., 2009, 11, 5664 DOI: 10.1039/B821484K
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