Cheating the diffraction limit: electrodeposited nanowires patterned by photolithography
Abstract
The diffraction limit, d≈λ/2, constrains the resolution with which structures may be produced using
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Department of Chemistry, University of California, Irvine, USA
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rmpenner@uci.edu
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The diffraction limit, d≈λ/2, constrains the resolution with which structures may be produced using
C. Xiang, Y. Yang and R. M. Penner, Chem. Commun., 2009, 859 DOI: 10.1039/B815603D
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