Issue 12, 2008
From the journal:

Lab on a Chip

Photoreactive coating for high-contrast spatial patterning of microfluidic device wettability†

Adam R. Abate,a   Amber T. Krummel,a   Daeyeon Lee,a   Manuel Marquez,bc   Christian Holtzed  and  David A. Weitz*a  

* Corresponding authors

a School of Engineering and Applied Sciences/Department of Physics, Harvard University, Cambridge, Massachusetts, USA
E-mail: weitz@seas.harvard.edu
Fax: +1 617 4953275
Tel: +1 617 496 2842

b NIST Center for Theoretical and Computational Nanosciences, Gaithersburg, MD, USA

c Harrington Department of Bioengineering, Arizona State University and Center for Integrated Nanotechnologies, Los Alamos National Laboratory, Los Alamos, NM, USA

d BASF, Ludwigshafin, Germany

Abstract

For many applications in microfluidics, the wettability of the devices must be spatially controlled. We introduce a photoreactive sol–gel coating that enables high-contrast spatial patterning of microfluidic device wettability.

Graphical abstract: Photoreactive coating for high-contrast spatial patterning of microfluidic device wettability

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Article information

DOI
https://doi.org/10.1039/B813405G
Article type
Communication
Submitted
05 Aug 2008
Accepted
01 Oct 2008
First published
17 Oct 2008

Lab Chip, 2008,8, 2157-2160

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Photoreactive coating for high-contrast spatial patterning of microfluidic device wettability

A. R. Abate, A. T. Krummel, D. Lee, M. Marquez, C. Holtze and D. A. Weitz, Lab Chip, 2008, 8, 2157 DOI: 10.1039/B813405G

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