Novel mixed alkylamido-cyclopentadienyl precursors for ALD of ZrO2 thin films
Abstract
Mixed alkylamido-cyclopentadienyl compounds of zirconium, (RCp)Zr(NMe2)3 (R = H, Me or Et) are introduced as precursors for
* Corresponding authors
a
Department of Chemistry, University of Helsinki, P.O. Box 55, University of Helsinki, Finland
E-mail:
jaakko.niinisto@helsinki.fi
b University of Tartu, Institute of Physics, Department of Materials Science, Tähe 4, Estonia
c Air Liquide Research & Development, 1 Chemin de la Porte des Loges, BP 126, Jouy-en-Josas, France
d Air Liquide Research & Development, DRTC, 200 GBC Drive, Newark, DE, USA
Mixed alkylamido-cyclopentadienyl compounds of zirconium, (RCp)Zr(NMe2)3 (R = H, Me or Et) are introduced as precursors for
J. Niinistö, K. Kukli, M. Kariniemi, M. Ritala, M. Leskelä, N. Blasco, A. Pinchart, C. Lachaud, N. Laaroussi, Z. Wang and C. Dussarrat, J. Mater. Chem., 2008, 18, 5243 DOI: 10.1039/B810922B
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