Issue 28, 2008
From the journal:

Journal of Materials Chemistry

Poly(glycidyl methacrylate)s with controlled molecular weights as low-shrinkage resins for 3D multibeam interference lithography†

Ali Hayek,‡a   Yongan Xu,‡b   Takashi Okada,a   Stephen Barlow,a   Xuelian Zhu,b   Jun Hyuk Moon,b   Seth R. Marder*a  and  Shu Yang*b  

* Corresponding authors

a Center for Organic Photonics and Electronics and School of Chemistry and Biochemistry, Georgia Institute of Technology, Atlanta, GA, USA
E-mail: seth.marder@chemistry.gatech.edu
Fax: +1 404 894 5909
Tel: +1 404 385 6048

b Department of Materials Science and Engineering, University of Pennsylvania, Philadelphia, PA, USA
E-mail: shuyang@seas.upenn.edu
Fax: +1 215 573 2128
Tel: +1 215 898 9645

Abstract

Poly(glycidyl methacrylate) has been shown to be a useful material for fabrication of photonic crystal templates using multibeam interference lithography, since it exhibits lower shrinkage than conventional SU8.

Graphical abstract: Poly(glycidyl methacrylate)s with controlled molecular weights as low-shrinkage resins for 3D multibeam interference lithography

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Article information

DOI
https://doi.org/10.1039/B809656B
Article type
Communication
Submitted
09 Jun 2008
Accepted
12 Jun 2008
First published
20 Jun 2008

J. Mater. Chem., 2008,18, 3316-3318

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Poly(glycidyl methacrylate)s with controlled molecular weights as low-shrinkage resins for 3D multibeam interference lithography

A. Hayek, Y. Xu, T. Okada, S. Barlow, X. Zhu, J. H. Moon, S. R. Marder and S. Yang, J. Mater. Chem., 2008, 18, 3316 DOI: 10.1039/B809656B

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