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Issue 28, 2008
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Poly(glycidyl methacrylate)s with controlled molecular weights as low-shrinkage resins for 3D multibeam interference lithography

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Abstract

Poly(glycidyl methacrylate) has been shown to be a useful material for fabrication of photonic crystal templates using multibeam interference lithography, since it exhibits lower shrinkage than conventional SU8.

Graphical abstract: Poly(glycidyl methacrylate)s with controlled molecular weights as low-shrinkage resins for 3D multibeam interference lithography

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Supplementary files

Article information


Submitted
09 Jun 2008
Accepted
12 Jun 2008
First published
20 Jun 2008

J. Mater. Chem., 2008,18, 3316-3318
Article type
Communication

Poly(glycidyl methacrylate)s with controlled molecular weights as low-shrinkage resins for 3D multibeam interference lithography

A. Hayek, Y. Xu, T. Okada, S. Barlow, X. Zhu, J. H. Moon, S. R. Marder and S. Yang, J. Mater. Chem., 2008, 18, 3316
DOI: 10.1039/B809656B

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