Issue 47, 2008
From the journal:

Chemical Communications

Wet-chemical approach for the halogenation of hydrogenated boron-doped diamond electrodes

Mei Wang,ab   Manash R. Das,a   Vera G. Praig,a   Francois LeNormand,c   Musen Li,b   Rabah Boukherroub*a  and  Sabine Szunerits*ad  

* Corresponding authors

a Institut de Recherche Interdisciplinaire (IRI, USR-CNRS 3078) and Institut d’Electronique, de Microélectronique et de Nanotechnologie (IEMN, UMR-CNRS 8520), Cité Scientifique, Avenue Poincaré-BP 60069, Villeneuve d’Ascq, France
E-mail: rabah.boukherroub@iemn.univ-lille1.fr
Fax: +33 (0) 03 20 19 78 84
Tel: +33 (0) 3 20 19 79 87

b School of Materials Science and Engineering, Shandong University, 73 Jingshi Road, Jinan, Shandong Province, P. R. China

c Institut de Physique et Chimie des Matériaux/Groupe Surfaces et Interfaces (IPCMS/GSI), UMR 7504 CNRS, Bat 69, 23 rue du Loess, BP 43, Strasbourg, France

d Laboratoire d'Electrochimie et de Physicochimie des Matériaux et des Interfaces (LEPMI), CNRS-INPG-UJF, 1130 rue de la piscine, BP 75, St. Martin d'Hères Cedex, France
E-mail: sabine.szunerits@lepmi.inpg.fr
Fax: +33 (0) 4 76 82 66 30
Tel: +33 (0) 4 76 82 65 52

Abstract

Brominated and chlorinated boron-doped diamond electrodes were prepared through a radical substitution reaction and reacted further with alkyl-Grignard reagents.

Graphical abstract: Wet-chemical approach for the halogenation of hydrogenated boron-doped diamond electrodes

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Article information

DOI
https://doi.org/10.1039/B810975C
Article type
Communication
Submitted
27 Jun 2008
Accepted
01 Oct 2008
First published
22 Oct 2008

Chem. Commun., 2008, 6294-6296

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Wet-chemical approach for the halogenation of hydrogenated boron-doped diamond electrodes

M. Wang, M. R. Das, V. G. Praig, F. LeNormand, M. Li, R. Boukherroub and S. Szunerits, Chem. Commun., 2008, 6294 DOI: 10.1039/B810975C

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