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Issue 17, 2008
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Photochemical fabrication of three-dimensional micro- and nano-structured surfaces from a C60 monoadduct

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Abstract

Exposure of Langmuir–Blodgett (LB) films of a C60 adduct supported on silicon wafers to UV light leads to cross-linking of the C60 moieties, which are resistant to removal by solvent exposure, whereas unexposed moieties are readily removed. This process provides a convenient and simple route for the fabrication of highly conjugated surface-attached structures, with dimensions ranging from micrometres (using masks) to a few tens of nanometres using light emitted from a scanning near-field optical microscope (SNOM). The SNOM writing velocity was found to significantly affect the lateral resolution and the height of the three-dimensional nanostructures. Increasing the writing velocity from 0.3 to 2 μm s−1 resulted in a decrease in the width of the structures from 240 nm to 70 nm (corresponding to the SNOM aperture diameter), respectively, and a reduction in the height from 8 nm (the thickness of the original film) to 3 nm, respectively. This approach provides a simple, direct route to surface-bound nanometre scale assemblies of C60.

Graphical abstract: Photochemical fabrication of three-dimensional micro- and nano-structured surfaces from a C60 monoadduct

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Article information


Submitted
07 Dec 2007
Accepted
21 Feb 2008
First published
06 Mar 2008

J. Mater. Chem., 2008,18, 2016-2021
Article type
Paper

Photochemical fabrication of three-dimensional micro- and nano-structured surfaces from a C60 monoadduct

P. Iqbal, S. Sun, M. D. Hanwell, D. Attwood, G. J. Leggett, J. A. Preece, T. H. Richardson and D. Tunnicliffe, J. Mater. Chem., 2008, 18, 2016
DOI: 10.1039/B718888A

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