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Issue 9, 2008
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Towards environmentally friendly, dry deposited, water developable molecular glass photoresists

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Abstract

Photoresists based on molecular glasses are gaining more and more importance as resist material to replace polymer based photoresist. In addition environmental issues have to be considered in the long-term. Therefore the paper describes novel negative photoresists containing a ternary mixture of a glassy low molecular functional polyphenol where the film preparation is possible by solvent-free physical vapor deposition. After UV light exposure and a thermal annealing process to enable acid catalyzed crosslinking between the molecular glass and the crosslinker, the photoresist was developed using only water to give well-defined patterns. In order to experimentally study efficiently the multiple parameters such as composition, exposure dose, and development times combinatorial PVD techniques were utilized.

Graphical abstract: Towards environmentally friendly, dry deposited, water developable molecular glass photoresists

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Publication details

The article was received on 12 Oct 2007, accepted on 30 Nov 2007 and first published on 17 Dec 2007


Article type: Paper
DOI: 10.1039/B715819J
Phys. Chem. Chem. Phys., 2008,10, 1257-1262

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    Towards environmentally friendly, dry deposited, water developable molecular glass photoresists

    F. Pfeiffer, N. M. Felix, C. Neuber, C. K. Ober and H. Schmidt, Phys. Chem. Chem. Phys., 2008, 10, 1257
    DOI: 10.1039/B715819J

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