Chemical vapour deposition of II–VI semiconductor thin films using M[(TePiPr2)2N]2 (M = Cd, Hg) as single-source precursors
Abstract
The
* Corresponding authors
a
The School of Chemistry and The School of Materials, The University of Manchester, Oxford Road, Manchester, UK
E-mail:
paul.obrien@manchester.ac.uk
Fax: +44 (0)161 275 4616
Tel: +44 (0)161 275 4652
b Department of Chemistry, University of Calgary, Calgary, AB T2N 1N4, Canada
The
S. S. Garje, J. S. Ritch, D. J. Eisler, M. Afzaal, P. O'Brien and T. Chivers, J. Mater. Chem., 2006, 16, 966 DOI: 10.1039/B515362J
To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.
If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.
If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.
Read more about how to correctly acknowledge RSC content.
Fetching data from CrossRef.
This may take some time to load.
Loading related content