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Issue 45, 2006
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Design of precursors for the CVD of inorganic thin films

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Abstract

Applications of inorganic thin films in the electronics industry have spurred activity in the area of chemical vapor deposition (CVD). This article discusses the increasingly sophisticated design strategies for precursor complexes through a series of case studies on CVD of metal oxide and metal nitride films.

Graphical abstract: Design of precursors for the CVD of inorganic thin films

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Publication details

The article was received on 16 Aug 2006, accepted on 10 Oct 2006 and first published on 17 Oct 2006


Article type: Frontier
DOI: 10.1039/B611848H
Citation: Dalton Trans., 2006,0, 5327-5333
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    Design of precursors for the CVD of inorganic thin films

    L. McElwee-White, Dalton Trans., 2006, 0, 5327
    DOI: 10.1039/B611848H

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