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Issue 33, 2006
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Electron beam lithographically-defined scanning electrochemical-atomic force microscopy probes: fabrication method and application to high resolution imaging on heterogeneously active surfaces

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Abstract

This paper describes in detail the use of electron beam lithography (EBL) to successfully batch microfabricate combined scanning electrochemical-atomic force microscopy (SECM-AFM) probes. At present, the process produces sixty probes at a time, on a 1/4 of a three-inch wafer. Using EBL, gold triangular-shaped electrodes can be defined at the tip apex, with plasma enhanced chemical vapor deposited silicon nitride serving as an effective insulating layer, at a thickness of 75 nm. The key features of the fabrication technique and the critical steps are discussed. The capability of these probes for SECM-AFM imaging in both tapping and constant distance mode is illustrated with dual topographical–electrochemical scans over an array of closely-spaced 1 μm diameter Pt disc electrodes, held at a suitable potential to generate an electroactive species at a transport-limited rate. As highlighted herein, understanding diffusion to heterogeneous electrode surfaces, including array electrodes, is currently topical and we present preliminary data highlighting the use of SECM-AFM as a valuable tool for the investigation of diffusion and reactivity at high spatial resolution.

Graphical abstract: Electron beam lithographically-defined scanning electrochemical-atomic force microscopy probes: fabrication method and application to high resolution imaging on heterogeneously active surfaces

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Publication details

The article was received on 24 Apr 2006, accepted on 19 May 2006 and first published on 31 May 2006


Article type: Paper
DOI: 10.1039/B605828K
Citation: Phys. Chem. Chem. Phys., 2006,8, 3909-3914

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    Electron beam lithographically-defined scanning electrochemical-atomic force microscopy probes: fabrication method and application to high resolution imaging on heterogeneously active surfaces

    P. S. Dobson, J. M. R. Weaver, D. P. Burt, M. N. Holder, N. R. Wilson, P. R. Unwin and J. V. Macpherson, Phys. Chem. Chem. Phys., 2006, 8, 3909
    DOI: 10.1039/B605828K

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