Electrical properties of V2O5 thin films obtained by atomic layer deposition (ALD)
Abstract
Dielectric and conductivity
* Corresponding authors
a
Laboratoire de Chimie Appliquée de l'Etat Solide (LCAES), UMR 7574, ENSCP, 11 rue P. et M. Curie, 75231 Paris Cedex 05, France
E-mail:
badot@ext.jussieu.fr (J. C. Badot)
Fax: +33 1 46 34 74 89
Tel: +33 1 53 73 79 28
b Laboratoire Liquides Ioniques et Interfaces Chargées (LI2C), UMR 7612, Université P. et M. Curie, 4 Place Jussieu, Boîte 51, 75252 Paris Cedex 05, France
c Laboratoire de Génie Electrique de Paris (LGEP), UMR 8507, SUPELEC, Plateau de Moulon, 91192 Gif-sur-Yvette Cedex, France
d Laboratoire d'Electrochimie et de Chimie Analytique (LECA), UMR 7575, ENSCP, 11 rue P. et M. Curie, 75231 Paris Cedex 05, France
Dielectric and conductivity
J. C. Badot, A. Mantoux, N. Baffier, O. Dubrunfaut and D. Lincot, J. Mater. Chem., 2004, 14, 3411 DOI: 10.1039/B410324F
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