Evaluation of poly(hydroxyethyl methacrylate) imaging chemistries for micropatterning applications†
Abstract
Chemical reactions leading to imaging of poly(2-hydroxyethyl methacrylate)
(PHEMA) based materials are investigated. Positive imaging is obtained upon exposure to deep UV and electron beam radiation following a chain scission mechanism. The presence of the OH group adds the possibility of development in alkaline aqueous solutions with considerably higher sensitivities than in the case of PMMA. On the other hand, negative tone