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Issue 21, 2004
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Dialkylcarbamato magnesium cluster complexes: precursors to the single-source chemical vapour deposition of high quality MgO thin films

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Abstract

Single source chemical vapour deposition (SSCVD) is a useful technique for preparing thin films, offering the simplicity of having all film components contained within the one molecule. However, the molecules currently used for SSCVD of MgO films are inconvenient due to high reactivity or expense. We report here the application of a novel hexameric diethylcarbamato complex Mg6(O2CNEt2)12 (1) as a single source precursor for MgO deposition. This precursor is simple to prepare, and has suitable volatility at moderate temperatures. SSCVD using 1 deposits high quality MgO films at deposition temperatures near 500 °C. Film analysis by XPS, XRD and SEM revealed a low carbon contamination and a film morphology that makes it suitable for use as a buffer layer between substrates and perovskite thin film coatings in electronic device construction.

Graphical abstract: Dialkylcarbamato magnesium cluster complexes: precursors to the single-source chemical vapour deposition of high quality MgO thin films

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Publication details

The article was received on 19 Apr 2004, accepted on 08 Jun 2004 and first published on 22 Sep 2004


Article type: Paper
DOI: 10.1039/B405816J
J. Mater. Chem., 2004,14, 3198-3202

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    Dialkylcarbamato magnesium cluster complexes: precursors to the single-source chemical vapour deposition of high quality MgO thin films

    M. R. Hill, A. W. Jones, J. J. Russell, N. K. Roberts and R. N. Lamb, J. Mater. Chem., 2004, 14, 3198
    DOI: 10.1039/B405816J

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