Issue 5, 2004
From the journal:

Journal of Materials Chemistry

Titanium sulfide thin films from the aerosol-assisted chemical vapour deposition of [Ti(SBut)4]

Claire J. Carmalt,*a   Shane A. O'Neill,a   Ivan P. Parkina  and  Emily S. Petersa  

* Corresponding authors

a Department of Chemistry, Christopher Ingold Laboratories, University College London, 20 Gordon Street, London, UK
E-mail: c.j.carmalt@ucl.ac.uk

Abstract

Gold, reflective TiS2 films have been produced from the single-source precursor [Ti(SBut)4] by aerosol-assisted chemical vapour deposition on glass. Films were deposited between 150 and 300 °C using hexanes, dichloromethane or toluene solvent. The titanium sulfide films were analysed by Raman, UV-Vis spectroscopy, scanning electron microscopy (SEM), X-ray powder diffraction, energy dispersive analysis of X-rays (EDAX) and X-ray photoelectron spectroscopy (XPS).

Graphical abstract: Titanium sulfide thin films from the aerosol-assisted chemical vapour deposition of [Ti(SBut)4]

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Article information

DOI
https://doi.org/10.1039/B311265A
Article type
Paper
Submitted
16 Sep 2003
Accepted
18 Dec 2003
First published
22 Jan 2004

J. Mater. Chem., 2004,14, 830-834

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Titanium sulfide thin films from the aerosol-assisted chemical vapour deposition of [Ti(SBut)4]

C. J. Carmalt, S. A. O'Neill, I. P. Parkin and E. S. Peters, J. Mater. Chem., 2004, 14, 830 DOI: 10.1039/B311265A

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