The gas-phase interaction of H3C–CH2–XH3 and H2C
C(H)XH3
(X = C, Si, Ge) with Ni+ has been investigated through the use of high-level density functional theory methods. The structures of the corresponding Ni+ complexes were optimized at the B3LYP/6-311G(d,p) level of theory. Final energies were obtained in single-point B3LYP/6-311+G(2df,2p) calculations. In all cases, the most stable complexes are stabilized through agostic-type interactions between the metal cation and the hydrogen atoms of the XH3 group. Only for propene is the conventional π-complex the global minimum of the potential energy surface. These agostic-type linkages can be viewed as three-center bonds resulting from electron-donor interactions between σ bonding orbitals of the neutral and the empty s orbital of the metal and back-donation from pairs of valence electrons of the metal into the corresponding σ* antibonding orbitals of the neutral. As a consequence, these bonds are particularly stable for Si- and Ge-containing compounds, because of the high electron-donor ability of the XH3 group when the heteroatom is Si or Ge. Vinylsilane and vinylgermane lead to non-conventional complexes in which the metal bridges the Cα atom of the C
C double bond and one of the hydrogen atoms of the XH3 group. In contrast with the behavior predicted when the reference acid is Cu+, Si- and Ge-derivatives, both saturated and unsaturated, bind Ni+ more strongly than propane and propene, respectively. Ni+ binding energies are systematically greater than Cu+ binding energies and the bond activation effects observed upon Ni+ attachment are sizably larger than those found upon Cu+ association.
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