Issue 12, 2003
From the journal:

Chemical Communications

Nanostructured silicon surfaces via nanoporous alumina

Matthias Kruse,a   Steffen Franzkaa  and  Günter Schmid*a  

* Corresponding authors

a Institut für Anorganische Chemie, Universität Essen, Universitätsstr. 5-7, 45117 Essen, Germany
E-mail: guenter.schmid@uni-essen.de
Fax: +49 201 1832401
Tel: +49 201 1834195

Abstract

Nanostructured silicon surfaces are generated using nanoporous alumina membranes as stamps to imprint PMMA films on silicon, followed by reactive ion etching (RIE).

Graphical abstract: Nanostructured silicon surfaces via nanoporous alumina

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Article information

DOI
https://doi.org/10.1039/B301340E
Article type
Communication
Submitted
02 Feb 2003
Accepted
17 Apr 2003
First published
13 May 2003

Chem. Commun., 2003, 1333-1335

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Nanostructured silicon surfaces via nanoporous alumina

M. Kruse, S. Franzka and G. Schmid, Chem. Commun., 2003, 1333 DOI: 10.1039/B301340E

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